Extreme ultraviolet mask roughness effects in high numerical aperture lithography
نویسندگان
چکیده
منابع مشابه
System-level line-edge roughness limits in extreme ultraviolet lithography
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ژورنال
عنوان ژورنال: Applied Optics
سال: 2018
ISSN: 1559-128X,2155-3165
DOI: 10.1364/ao.57.001724